Document
About this Digital Document
A study was made of the resistivity and structure of films deposited at substrate temperatures varying from 200 degrees C to 660 degrees C.
Full Title
A study of the effects of substrate temperature during deposition and annealing of tantalum thin films
Member of
Contributor(s)
Creator: Penkunas, Joseph R.
Thesis advisor: Wood, John D.
Publisher
Lehigh University
Date Issued
1966-05
Language
English
Type
Genre
Form
electronic documents
Department name
Materials Science and Engineering
Digital Format
electronic documents
Media type
Creator role
Graduate Student
Identifier
1048261499
https://asa.lib.lehigh.edu/Record/10946731
Keywords
Penkunas, . J. R. (1966). A study of the effects of substrate temperature during deposition and annealing of tantalum thin films (1–). https://preserve.lehigh.edu/lehigh-scholarship/graduate-publications-theses-dissertations/theses-dissertations/study-effects-1
Penkunas, Joseph R. 1966. “A Study of the Effects of Substrate Temperature During Deposition and Annealing of Tantalum Thin Films”. https://preserve.lehigh.edu/lehigh-scholarship/graduate-publications-theses-dissertations/theses-dissertations/study-effects-1.
Penkunas, Joseph R. A Study of the Effects of Substrate Temperature During Deposition and Annealing of Tantalum Thin Films. May 1966, https://preserve.lehigh.edu/lehigh-scholarship/graduate-publications-theses-dissertations/theses-dissertations/study-effects-1.
