Text

Influence of deposition temperature and front gate materials on negative fixed charges at alumina-silicon interfaces

About this Digital Document

In this paper, the negative fixed charge at alumina-silicon interfaces is investigated. First, sample electrical behavior after aging in a glove box for eight months was investigated and the capacitance-voltage (C-V) curves did not significantly change. I

Full Title
Influence of deposition temperature and front gate materials on negative fixed charges at alumina-silicon interfaces
Member of
Theses and Dissertations
Contributor(s)
Creator: Cui, Yuxing
Thesis advisor: Strandwitz, Nicholas C.
Publisher
Lehigh University
Date Issued
2020-08
Language
English
Type
Text
Genre
theses
Form
electronic documents
Department name
Materials Science and Engineering
Digital Format
electronic documents
Media type
application/pdf
Creator role
Graduate Student
Subject (LCSH)
Materials science
Keywords
ALD
alumina-silicon interfaces
Deposition temperature
MOSCaps
negative fixed charges

Citation


        
      

              

        
@mastersthesis{cui2020,
  title = {Influence of deposition temperature and front gate materials on negative fixed charges at alumina-silicon interfaces},
  author = {Cui, Yuxing},
  year = {2020},
  month = aug,
  publisher = {Lehigh University},
  keywords = {ALD, alumina-silicon interfaces, Deposition temperature, MOSCaps, negative fixed charges},
  abstract = {In this paper, the negative fixed charge at alumina-silicon interfaces is investigated. First, sample electrical behavior after aging in a glove box for eight months was investigated and the capacitance-voltage (C-V) curves did not significantly change. I},
  language = {English},
}