Document
About this Digital Document
The effects of nitrogen on the properties of anodic oxides formed on tantalum thin films reactively sputtered in nitrogen were investigated.
Full Title
Dielectric properties of anodic oxides formed on thin films of reactively sputtered nitrided tantalum
Member of
Contributor(s)
Creator: Simmons, Russell
Thesis advisor: Smyth, Donald M.
Publisher
Lehigh University
Date Issued
1972-05
Language
English
Type
Genre
Form
electronic documents
Department name
Materials Science and Engineering
Digital Format
electronic documents
Media type
Creator role
Graduate Student
Identifier
1048262087
https://asa.lib.lehigh.edu/Record/10947309
Keywords
Simmons, . R. (1972). Dielectric properties of anodic oxides formed on thin films of reactively sputtered nitrided tantalum (1–). https://preserve.lehigh.edu/lehigh-scholarship/graduate-publications-theses-dissertations/theses-dissertations/dielectric
Simmons, Russell. 1972. “Dielectric Properties of Anodic Oxides Formed on Thin Films of Reactively Sputtered Nitrided Tantalum”. https://preserve.lehigh.edu/lehigh-scholarship/graduate-publications-theses-dissertations/theses-dissertations/dielectric.
Simmons, Russell. Dielectric Properties of Anodic Oxides Formed on Thin Films of Reactively Sputtered Nitrided Tantalum. May 1972, https://preserve.lehigh.edu/lehigh-scholarship/graduate-publications-theses-dissertations/theses-dissertations/dielectric.
