Text

Development of a High-Pressure Spatial Chemical Vapor Deposition Tool for Growth of Functional Materials

About this Digital Document

Development of next generation devices for high power, high frequency emitters, high efficiency electrical power conversion, and short wavelength (UV) emitters requires further development of the group III-N material system. Of particular challenge is the

Full Title
Development of a High-Pressure Spatial Chemical Vapor Deposition Tool for Growth of Functional Materials
Member of
Theses and Dissertations
Contributor(s)
Creator: Yousefian, Pedram
Thesis advisor: Pimputkar, Siddha
Publisher
Lehigh University
Date Issued
2020-08
Language
English
Type
Text
Genre
theses
Form
electronic documents
Department name
Materials Science and Engineering
Digital Format
electronic documents
Media type
application/pdf
Creator role
Graduate Student
Subject (LCSH)
Materials science
Keywords
high-pressure CVD
HPS-CVD
Indium nitride
InGaN growth
Super-atmospheric

Citation


        
      

              

        
@mastersthesis{yousefian2020,
  title = {Development of a High-Pressure Spatial Chemical Vapor Deposition Tool for Growth of Functional Materials},
  author = {Yousefian, Pedram},
  year = {2020},
  month = aug,
  publisher = {Lehigh University},
  keywords = {high-pressure CVD, HPS-CVD, Indium nitride, InGaN growth, Super-atmospheric},
  abstract = {Development of next generation devices for high power, high frequency emitters, high efficiency electrical power conversion, and short wavelength (UV) emitters requires further development of the group III-N material system. Of particular challenge is the},
  language = {English},
}