Date

1967

Document Type

Thesis

Degree

Master of Science

Department

Materials Science and Engineering

First Adviser

Tauber, Richard N.

Abstract

Highly nitrided tantalum thin films, ranging in thickness from 1600 A to 3050 A, were cathodically sputtered onto quartz substrates in a pure nitrogen atmosphere. The effects of cathode current density and film thickness on the film structure, crystal structure, composition, resistivity, current-voltage characteristics and optical energy gap were studied.

Comments

Former department name: Metallurgy and Materials Science

Included in

Metallurgy Commons

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