Master of Science
Materials Science and Engineering
Tauber, Richard N.
Highly nitrided tantalum thin films, ranging in thickness from 1600 A to 3050 A, were cathodically sputtered onto quartz substrates in a pure nitrogen atmosphere. The effects of cathode current density and film thickness on the film structure, crystal structure, composition, resistivity, current-voltage characteristics and optical energy gap were studied.
Coyne, Harold J. Jr., "Preparation, structure and properties of sputtered, highly nitrided, tantalum films" (1967). Theses and Dissertations. 3603.