Master of Science
Materials Science and Engineering
Tauber, Richard N.
Thin silicon nitride films have been deposited on silicon substrates by audio frequency reactive sputtering in a hollow cathode supported nitrogen plasma. All films were amorphous and had properies comparable to or better than that of films produced by other techniques.
McKnight, Hugh M., "Some physical properties of silicon nitride thin films prepared by audio frequency sputtering in a nitrogen plasma" (1967). Theses and Dissertations. 3588.