Date

1967

Document Type

Thesis

Degree

Master of Science

Department

Materials Science and Engineering

First Adviser

Tauber, Richard N.

Abstract

Thin silicon nitride films have been deposited on silicon substrates by audio frequency reactive sputtering in a hollow cathode supported nitrogen plasma. All films were amorphous and had properies comparable to or better than that of films produced by other techniques.

Comments

Former department name: Metallurgy and Materials Science

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