Date

1966

Document Type

Thesis

Degree

Master of Science

Department

Materials Science and Engineering

First Adviser

Krauss, George E.

Abstract

The primary objectives of this paper were to investigate the effects of deposition rate and substrate temperature on the grain structure and resistivity of thin aluminum films produced by electron beam vapor deposition. Secondary objectives were to study the mechanism of film growth and annealing.

Comments

Former department name: Metallurgy and Materials Science

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