Master of Science
Materials Science and Engineering
Walter C. Hahn, Jr.
The nucleation rate of tantalum sputtered in a thin film on glass was investigated to determine the affect of the application of niobium pentachloride to the substrate prior to the deposition of the tantalum.
Haralson, R. H., "Seeding of tantalum thin films" (1965). Theses and Dissertations. 3375.