Date

1965

Document Type

Thesis

Degree

Master of Science

Department

Materials Science and Engineering

First Adviser

Walter C. Hahn, Jr.

Abstract

The nucleation rate of tantalum sputtered in a thin film on glass was investigated to determine the affect of the application of niobium pentachloride to the substrate prior to the deposition of the tantalum.

Comments

Former department name: Metallurgy and Materials Science

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