Master of Science
Materials Science and Engineering
Krauss, George E.
Spectrographic analysis reveal that the only essential difference between films sputtered from the differenct source materials was the presence in the films of the intentional source impurities. In view of the marked differences in resistivities observed it is believed that the electrical behavior of the crystalline films is dominated by impurity effects.
Kumagai, Henry Yasuo, "The preparation and properties of thin silicon films deposited on amorphous substrates by cathodic sputtering" (1964). Theses and Dissertations. 3258.