The properties, structure and heat treatment of thin p-type silicon films deposited on amorphous fused silica by cathodic sputtering

The properties, structure and heat treatment of thin p-type silicon films deposited on amorphous fused silica by cathodic sputtering

Advanced Search

Choose the citation style.
The properties, structure and heat treatment of thin p-type silicon films deposited on amorphous fused silica by cathodic sputtering. (1965). The properties, structure and heat treatment of thin p-type silicon films deposited on amorphous fused silica by cathodic sputtering.

Datastream Download